Publications


Books

2002

  • K. Edinger, Book Chapter, "Focused Ion Beams for Direct Writing" in "Direct Write Technologies for Rapid Prototyping," edited by A. Pique and D. Chrisey (Academic Press, San Diego, CA, 2002), p. 347-383.

    2001

  • A. Stanishevsky, Book Chapter, "Fabrication, Characterization and Post-Processing of the Cathodic Arc Derived Hydrogen-Free Tetrahedral Amorphous Carbon" in Handbook of Surfaces and Interfaces of Materials, Volume 4, Chapter 5, edited by H. S. Nalwa (Academic Press, San Diego, CA, 2001), p. 282-334.

    Refereed Journals

    2002

  • A. Stanishevsky, V. Nagarajan, J. Melngailis, R. Ramesh, L. Kriachtchev and E. McDaniel, "Radiation Damage and Its Recovery in Focused Ion Beam Fabricated Ferroelectric Capacitors," J. Appl. Phys. 92, 3275-3278 (2002).

  • V. Nagarajan, A. Stanishevsky, L. Chen, T. Zhao, B.-T. Liu, J. Melngailis, A. L. Roytburd, R. Ramesh, Jü Finder, Z. Yu, R. Droopad, and K. Eisenbeiser, "Realizing Intrinsic Piezoresponse in Epitaxial Submicron Lead Zirconate Titanate Capacitors on Si," Appl. Phys. Lett. 81 (22), 4215-4217 (2002).

  • T. Brintlinger, Yung-Fu Chen, T. Dürkop, Enrique Cobas, M. S. Fuhrer, John D. Barry, and John Melngailis, "Rapid Imaging ofNanotubes on Insulating Substrates," Appl. Phys. Lett. 81 (13), 2454-2456 (2002).

    2001

  • S. Schiestel, B. Molnar, C. A. Carosella, R. M. Stroud, D. Knies, and K. Edinger, "Patterning of GaN by Ion Implantation-Dependent Etching," Mater. Sci. Eng., B82, 111 (2001).

    2000

  • A. Stanishevsky, H. Li, A. Badzian, T. Badzian, W. Drawl, Yu. Khriachtchev, and E. McDaniel, "B-C-N Coatings Prepared by Microwave Chemical Vapor Deposition," Thin Solid Films 398-399 (2001) 270-274.

  • A. Stanishevsky, "Patterning of Diamond and Amorphous Carbon Films Using Focused Ion Beams," Thin Solid Films 398-399 (2001) 560-564.

  • S. Tiedke, T. Schmitz, K. Prume, A. Roelofs, T. Schneller, U. Kall, R. Waser, C. S. Ganpule, V. Nagarajan, A. Stanishevsky, and R. Ramesh, "Direct Hysteresis Measurements of Single Nanosized Ferroelectric Capacitors Contacted with an Atomic Force Microscope," Appl. Phys. Lett. 79, 3678 (2001).

  • R. Yongsunthon, A. Stanishevsky, J. McCoy, and E. D. Williams, "Observation of Current Crowding near Fabricated Voids in Gold Lines," Appl. Phys. Lett. 78, 2661-2663 (2001).

  • K. Edinger and Th. Kraus, "Modeling of Fucosed Ion Beam Induced Surface Chemistry," J. Vac. Sci. Technol. B 18, 3190 (2000).

  • Golzhauser, W. Geyer, V. Stadler, W. Eck, M. Grunze, T. Weimann, P. Hinze, and K. Edinger, "Nanoscale Patterning of Self-Assembled Monolayers with Electrons," J. Vac. Sci. Technol. B 18, 3414 (2000).

  • J. Voigt, A. Iline, F. Shi, P. Hudeck, I. Rangelow, G. Mariotto, I. Shvets, P. Gunther, H. Loschner, and K. Edinger, "Progress on Nanostructuring with Nanojet," J. Vac. Sci. Technol. B 18, 3525 (2000).

  • F. Machalett, K. Edinger, J. Melngailis, M. Diegel, K. Steenbeck, and E. Steinbeiss, "Direct Patterning of Gold Oxide Thin Films," Appl. Phys. A71, 331 (2000).

  • F. Machalett, K. Edinger, J. Melngailis, P. Seidel, and T. Venkatesan, "Accurate Location and Marking of Grain Boundaries Using Focused Ion and Electron Beams," Nucl. Instrum. Meth. Phys. Res. B 170, 474 (2000).

  • F. Machalett, K. Edinger, L. Ye, and J. Melngailis, "Focused Ion Beam Writing of Electrical Contacts into Platinum Oxide Films," Appl. Phys. Lett. 76, 3445 (2000).

    1999

  • A. A. Iliadis, S. N. Andronesky, W. Wang, R. D. Vispute, A. Stanishevsky, J. H. Orloff, R. P. Sharma, T. Venkatesan, M. C. Wood, and K. A. Jones. "Pt and W Ohmic Contacts to p-6H-SiC by Focused Ion Beam Direct-Write Deposition," J. Electron. Mater. 28, 136 (1999).

  • K. Edinger, "Gas Assisted Etching of Copper with Focused Ion Beams," J. Vac. Sci. Technol. B 17, 3058 (1999).

  • I. Jin, C.-H. Chen, S. P. Pai, B. Ming, D. J. Kang, T. Venkatesan, F. Machalett, K. Edinger, J. Orloff, and J. Melngailis, "Fabrication of HTS Josephson Junctions on Substrates Prepared by Focused Ion Beam System," IEEE Trans. Appl. Supercond. 9, 2894 (1999).

  • J. Fielding, K. Edinger, and C. Davis, "Experimental Observation of Mode Evolution in Angle-Mode Tapered Optical Fibers," IEEE J. Lightwave Technol. 17, 1649 (1999).

    1998

  • K. Edinger, J. Melngailis, and J. Orloff, "A Study of Precursor Gases for Ion Beam Insulator Deposition," J. Vac. Sci. Technol. B16, 3311 (1998).

  • C.-H. Shen, James Murugia, Neil Goldsman, Marty Peckerar (Fellow, IEEE), John Melngailis (Senior Member, IEEE), and Dimitri Antoniadis (Fellow, IEEE), "Use of Focused Ion Beam and Modeling to Optimize Submicron MOSFET Characteristics," IEEE Trans. Electron Devices 45, N2 (1998).

  • J. Melngailis, A. A. Mondelli, Ivan L. Berry III, and R. Mohondro, "A Review of Ion Projection Lithography," J. Vac. Sci. Technol. B16, 927 (1998).

  • W. Wang, D. McCarthy, D. Park, D. Ma, M. Peckerar, N. Goldsman, J. Melngailis, and I. L. Berry, "Fabrication and Characterization of Buried Subchannel Implant n-Metal-Oxide-Semiconductor Transistors," J. Vac. Sci. Technol. B16, 3812 (1998).

  • A. A. Iliadis, S. N. Andronescu, K. Edinger, J. Orloff, R. D. Vispute, R. P. Sharma, V. Talyansky, T. Venkatesan, M. C. Wood, and K. Jones, "Ohmic Contacts to p-6H-SiC Using Focused Ion Beam Surface Modification and Pulsed Laser Epitaxial TiN Deposition," Appl. Phys. Lett. 73, 1 (1998) .

  • A. Stanishevsky, "Fabrication of Submicron Structures in CVD Diamond by Focused Ion Beam," J. Superhard Mater. 20, 4 (1998).

  • C. Narayana, H. Luo, J. Orloff, and A. Ruoff, "Solid Hydrogen at 342 Gpa: No Evidence for an Alkali Metal," Nature 393, 46 (1998).

  • A. Stanishevsky, S. Aggarwal, J. Melngailis, R. Ramesh, and A. S. Prakash, "Focused Ion-Beam Patterning of Nanoscale Ferroelectric Capacitors," J. Vac. Sci. Technol. B16, 3899 (1998).

  • C.-H. Chen, I. Jin, S. P. Pai, Z. W. Dong, R. P. Sharma, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, J. Melngailis, Z. Zhang, and W. K. Chu, "Combined Method of Focused Ion Beam Milling and Ion Implantation Techniques for the Fabrication of High Temperature Superconductor Josephson Junctions," J. Vac. Sci. Technol. B 16, 2898 (1998).

  • C.-H. Chen, I. Jin, S. P. Pai, Z. W. Dong, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, and J. Melngailis, "Fabrication of HTS Josephson Junctions on Substrates Patterned by Focused Ion Beam," Appl. Phys. Lett. 73, 1730 (1998).

  • S. Pilevar, K. Edinger, W. Atia, I. Smolynianov, and C. Davis, "Focused Ion Beam Fabrication of Fiber Probes with Well-Defined Apertures for Use in Near-Field Scanning Optical Microscopy," Appl. Phys. Lett. 71, 3133 (1998).

    1997

  • L. Didenko, J. Melngailis, H. Loschner, G. Stengl, A. Chalupka, and A. Shimkunas, "Analysis of Stencil Mask Distortion in Ion Projection Lithography," Microelectron. Eng. 35, 443 (1997).

  • C.-H. Chen, Z. Trajanovic, Z. W. Dong, C. J. Lobb, T. Venkatesan, K. Edinger, J. Orloff, and J. Melngailis, "Fabrication of High Temperature Superconductor Josephson Junctions by Focused Ion Beam Milling," J. Vac. Sci. Technol. B15, 2379 (1997).

  • "Handbook of Charged Particle Optics," CRC Press, Boca Raton (1997), J. Orloff, Ed.

  • D. Santamore, K. Edinger, J. Orloff, and J. Melngailis, "Focused Ion Beam Sputter Yield Changes as a Function of Scan Speed," J. Vac. Sci. Technol. B15, 2346 (1997).

  • Klaus Edinger, Victor Yun, John Melngailis, Jon Orloff, and Gerald Magera, "Development of a High Brightness Gas Field Ion Source," J. Vac. Sci. Technol. B15, 2365 (1997).

  • L. C. Chao, J. Orloff, and Li Wang, "Spherical Aberration Corrector Using Space Charge," J. Vac. Sci. Technol. B15, 2732 (1997).

  • I. L. Berry, A. A. Mondelli, J. Nichols, and J. Melngailis, "Programmable Aperture Plate for Maskless High-Throughput Nanolithography," J. Vac. Sci. Technol. 15, 2382 (1997).

  • K. Edinger, M. Grunze, and Ch. Wöll, "Corrosion of Gold by Alkane Thiols," Ber. Bunsenges. Phys. Chem. 101, 1811 (1997).

    1996

  • J. Orloff, L. W. Swanson and M. Utlaut, "Fundamental Limits on Imaging Resolution in Focused Ion Beam Systems," J. Vac. Sci. Technol. B14, 2759 (1996).

  • J. Funatsu, C. V. Thompson, J. Melngailis, and J. N. Walpole, "Laser Assisted Focused-Ion-Beam-Induced Deposition of Copper," J. Vac. Sci. Technol. B14, 179 (1996).

  • S. K. Guharay, W. Wang, V. G. Dudnikov, M. Reiser, J. Orloff, and J. Melngailis, "High-Brightness Ion Source for Ion Projection Lithography," J. Vac. Sci. Technol. B14, 3907 (1996).

  • S. Schiestel, P. Banniza, G. K. Wolf, and K. Edinger, "Modification of Intrinsically Conducting Polymers by Ion Implantation," Nucl. Instrum. Meth. Phys. Res. B 116, 164 (1996).

    1995

  • T. Tang, L. Wang, and J. Orloff, "Monte-Carlo Simulation of Discrete Space Charge Effects in Space Charge Lenses," Optik 102, 141 (1995).

  • C.-H. Chen, S. K. Guharay, M. Reiser, J. Riordan, J. Orloff, and J. Melngailis, "Study of H- Beams for Ion-Projection Lithography," J. Vac. Sci. Technol. B13, 2597 (1995).

  • M. A. Armstrong, S. Etchin, J. Melngailis, and D. A. Antoniadis, "Room Temperature Characteristics of Long-Channel AlGaAs/GaAs In-Plane-Gate Field Effect Transistors," J. Appl. Phys. 78, 560 (1995).

  • E. T. Ada, L. Hanley, S. Etchin, J. Melngailis, W. J. Dressick, M.-S. Chen, and J. M. Calvert, "Ion Beam Modification and Patterning of Organosilane Self-Assembled Monolayers," J. Vac. Sci. Technol. B13, 2189 (1995).

  • J. S. Ro, C. V. Thompson, and J. Melngailis, "Microstructure of Gold Grown by Ion-Induced Deposition," Thin Solid Films 258, 333 (1995).

  • A. Birman, B. Levush, and J. Melngailis, "Control of Temperature Gradients and Distortion of Ion Projection Lithography Masks," J. Vac. Sci. Technol. B13, 2584 (1995).

  • Tiantong Tang, Jon Orloff, and Li Wang, "Modeling and Design of Space Charge Lenses/Aberration Correctors for Focused Ion Beam Systems," J. Vac. Sci. Technol. B14, 80 (1996).

  • Jon Orloff, "Limits on Imaging Resolution of Focused Ion Beam Systems," SPIE Proc. 2522, Charged Particle Optics 412 (1995).

  • Li Wang, Jon Orloff, and Tiantong Tang, "Study of Space Charge Devices for Focused Ion Beam Systems," J. Vac. Sci. Technol. B13, 2414 (1995).

  • L. Wang, J. Orloff, D. Book, and T. Tang, "A New Method for Calculating the Axial Potential Due to Space Charge in Electrostatic Optics," J. Phys. D 28, 1791 (1995).

    1994

  • J. S. Ro, C. V. Thompson, and J. Melngailis, "Mechanism of Ion Beam Induced Deposition of Gold," J. Vac. Sci. Technol. B12, 73 (1994).

  • A. Chalupka, G. Stengl, H. Buschbeck, G. Lammer, H. Vonach, R. Fischer, E. Hammel, H. Löschner, R. Nowak, P. Wolf, W. Finkelstein, R. W. Hill, I. L. Berry, L. R. Harriott, J. Melngailis, J. N. Randall, J. C. Wolfe, H. Stroh, H. Wollnik, A. A. Mondelli, J. J. Petillo, and K. Leung, "Novel Electrostatic Column for Ion Projection Lithography," J. Vac. Sci. Technol. B12 (1994) 3513.

    1993

  • J. Melngailis. "Focused Ion Beam Lithography," (review article), Nuclear Instrum. Methods in Phys. Res., B80/81, 1271 (1993).

  • J. Orloff, "High Resolution Focused Ion Beams," invited review paper, Rev. Sci. Instrum. 64 (1993) 1105.

  • K. Edinger, A. Gölzhäuser, K. Demota, Ch. Wöll and M. Grunze, "Formation of Self-Assembled Monolayers of N-Alkanethiols on Gold: A Scanning Tunneling Microscopy Study on the Modification of Substrate Morphology," Langmuir 9, 4 (1993).