John Orloff

Biographical Sketch June 1996

A. VITAE:

Jon Orloff
Energy Research Building
Phone: (301) 405-5022
University of Maryland
Fax: (301) 314-9437
College Park, MD 20742-3511
E-mail: jono@glue.umd.edu


Professional History:

  • Professor, University of Maryland, Department of Electrical Engineering, 1993 -

  • Professor, Oregon Graduate Institute, Department of Applied Physics and Electrical Engineering, 1984 - 1993.

  • Visiting Scientist, by invitation of CNRS, Laboratoire de Mictosctructures et Microelectronique, Bagneux, France, Summer 1985.

  • Associate Professor, Oregon Graduate Institute, Department of Applied Physics and Electronic Science, 1980 - 1984.

  • Assistant Professor, Oregon Graduate Institute, Department of Applied Physics and Electronic Science, 1978 - 1980.

    Education:

    Ph.D. Applied Physics, Oregon Graduate Institute, 1977
    B.Sc. Physics, MIT, 1964

    Research Interests:

    High brightness electron and ion sources and charged particle optics. Focused ion and electron beams and their applications for micromachining, surface analysis and microscopy. Instrumentation development for semiconductor device manufacturing.


    Awards:

  • National Science Foundation Presidential Young Investigator Award in Physics (1984).
  • IBM Corporation Grant for Excellence in Electron Optics (1983).

    Publications


  • J. Orloff, L.W. Swanson and M. Utlaut, Fundamental Limits on Imaging Resolution in Focused ion Beam Systems, in press, J. Vac. Sci. Tech. (1996)

  • Li Wang, Jon Orloff, and Tiantong Tang, Study of Space-Charge Devices for Focused Ion Beam Systems, J. Vac. Sci. Technol., B 13(6), Nov/Dec 1995.

  • Jon Orloff, High-Resolution Focused Ion Beams, Rev. Sci. Instrum. 64 (5), May 1993.

  • M Sato and J. Orloff, A New Concept of Theoretical Resolution of an Optical System, Comparison With Experiment and Optimum Condition for a Point Source, Ultramicroscopy 41 (1992) 181-192.

  • M. Sato and J. Orloff, A Method for Calculating the Current Density of Charged Particle Beams and the Effect of Finite Source Size and Spherical and Chromatic Aberrations on the Focusing Characteristics, J. Vac. Sci. Technol., B 9(5), Sep/Oct 1991.

  • J. Orloff, J.-Z. Li, and M. Sato, Experimental Study of a Focused Ion Beam Probe Size and Comparison With Theory, J. Vac. Sci Technol., B 9(5), Sep/Oct 1991.

  • J. Puretz, R. K. De Freez, R. A. Elliot, J. Orloff, and T. L. Paoli, 300mW Operation of a Surface-Emitting Phase-Locked Array of Diode Lasers, Electronic Letters, 29 Jan. 1987, Vol. 23, No. 3, pp. 130-131.

  • P. Sudraud, J. Orloff, and G. Benassayag, The Effect of Carbon Bearing Gases and Secondary Electron Bombardment on a Liquid Metal Ion Source, Journal de Physique, Colloque C7, supplément au no 11, Tome 47, Novembre 1986.

  • J. Orloff and L. W. Swanson, An Asymmetric Electrostatic Lens For Field-Emission Microprobe Applications, J. Appl. Phys. 50(4), April 1979.

  • J. Orloff and L. W. Swanson, Fine-Focus Ion Beams With Field Ionization, J. Vac. Sci. Technol., 15(3), May/June 1978.