The equipment features a 150 KV linear accelerating column with an ExB mass filter. This allows for alloy sources to be used. Currently, an Arsenic-Palladium-Boron source is being used for implanting doping elements into solid state experimental devices. Other features include an imaging system using a channel electron multiplier (CEM), an X,Y stage for precision positioning with a laser interferometer, a 6" wafer pallet with an insertion/extraction system through a load-lock, three apertures for selecting beam current while in operation, and basic pattern writing software.
