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Focused Ion Beam NanoFabrication

Focused ion beams are widely used for the mask repair, implantation, milling, deposition and secondary electron/ion imaging. FIB provides unique capabilities for new prototype device modification, fundamental study of the ion/surface interaction, and much more. Focused ion beams are the main profile of the Laboratory for Ion Beam Research and Applications, University of Maryland.
An example, the Micrion FIB-2500 (pictured), has 5 nm ion beam column, a liquid Ga ion source and an accelerating voltage up to 50 kV. This precise instrument has been used to fabricate a number of submicron structures for different applications.

FIB was recently used to fabricate submicron ferroelectric capacitor structures with a size down to 0.01 µm2.
Ion beam scans the surface in a choosen pattern resulting in the material removal. The milling process in motion of a multilayer thin film structure, and the resulting pattern, are shown in these pictures.
The size of the moving image is 3x3 µm.		 FIB in motion 100 nm capacitor

FIB diamond FIB milled tip in a CVD diamond microcrystal. The tip height is ~400 nm, and a radius is ~40 nm.

  • A.Stanishevsky. Focused ion beam patterning of diamondlike carbon films. Diamond Relat.Mater., 8 (1999) 1164.

  • A.A.Iliadis, S.N.Andronesky, W.Wang, R.D.Vispute, A.Stanishevsky, J.H.Orloff, R.P.Sharma, T.Venkatesan, M.C.Wood, and K.A.Jones. Pt and W ohmic contacts to p-6H-SiC by focused ion beam direct-write deposition. J.Electron.Mater., 28 (1999) 136.

  • A.Stanishevsky. Fabrication of submicron structures in CVD diamond by focused ion beam. Journal of Superhard Materials,20, N6 (1998) 4.

  • A.Stanishevsky, A.S.Prakash, S.Aggarwal, J.Melngailis, and R.Ramesh. Focused ion-beam patterning of nanoscale ferroelectric capacitors. Proc. of 42nd Int.Conf. Ion, Electron, Photon Beam Technol. and Nanofarfication., May 26-29 (1998), Chicago,Il. J.Vac.Sci.Technol.B, 16 (1998) 3899.

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